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XWDS-14280STG wafer substrate ultrasonic cleaning machine

Suitable for wafer, germanium square, wet development, and optical glass cleaning machines.

Equipped with a filtration and circulation system, the cleaning solution is continuously clean.

Equipped with a workpiece and an up and down shaking system, the cleaning system has a more uniform and better effect.

The arc-shaped interval has a saw shaped overflow structure, which is beautiful and practical.

Using 40KHz/80KHz/100KHz equal frequency ultrasonic frequencies.

Ultrasound uses a generator with an efficiency of up to 95%, and the power is adjustable from 10% to 100%.

Using SUS/316 # stainless steel material, it has excellent acid and alkali resistance for cleaning.

Equipped with overload protection and alarms for freezing, filtering, and throwing.

Multi slot ultrasonic cleaning process ensures cleanliness.

High pressure spray cleaning combined with ultrasonic cleaning in the tank provides better results.

◆ Automatic liquid storage replenishment can ensure the uniformity and stability of the product.

Product Description